ion plating machine is multi-functional vacuum machine which is suitable for coating different material.It is a kind of low energy consumption and environment friendly machine which has more advantages compare with those like products. Voltaic source ion pulse and mid-frequency magnetron sputtering technology combined together make the equipment widely used. It can avoid strike fire, anode disappear target poisoning with mid-frequency power source and twins target, increase ionized factor, sputtering speed ratio and deposition speed. It is suitable for coating compound such as SiO2, ZrO2, TiO2, TiN, TiC, TiCN, TiAlN. It is widely used in crystal,horologe, glasses frame, mobile shell, hardware, sanitary ware, dishware, cutter & mould which require antifriction and extra hard films. It can be used for coating TiN, TiCN, CrN, TiALN, TiNbu, TiCrN, ZrN, TiNC and DLC film. Model ZCK-1150 magnetron sputtering coater Chamber size Φ1150x1200 Fixture size 9shafts,Φ220x900 top rotation Pumping time From atmosphere 8x10-3Pa<12min unloaded Ultimate vacuum ≤4x10-4Pa Voltaic arc source 8pieces 2KW Mid-frequency target 1pair 30KW Monopole pulse negative bias 20KW100-1000V 20A 50V-500V 40A Baking temperature 350 thermostatic control Vacuum system KT-400(2 sets)/F400/3500 Molecular pump(2 sets),ZJP-300, 2X-70 Inflation system Three ways mass flow controller (500ccm two ways and 1000ccm one way) Filament ionized system Filament heating: 10kw heater bias: 3kw Heating system 18KW Total / average power 50KW/30KW Used for Hardware, mobile and electronics Remark Can be designed according to customers request