Ceramic & Tiles MF magnetron sputtering Vacuum

Magnetron sputtering, Mid-frequency and Multi-arc Ion Coating Equipment combine three kinds of technologies: DC magnetron sputtering, mid-frequency sputtering and multi-arc ion. It is widely used for coating TiN, TiC, TiCN, TiAIN, CrN, Cu, Au, DLC and decorative film on the surface of substrates. Magnetron sputtering technique helps to increase attaching force, density of film layer. PLC and HMI make up the fully automatic electric controlling system. Technical parameter specification ModelZCK-1000ZCK-1150ZCK-1200ZCK-1400ZCK-1600Chamber Size1000×12001150×12001200×14001400×16001600×1950Coating Film TypeTiN, TiC, TiAIN, antifriction and super hard film, DLC, decorative film Supply TypeDC supply, mid-frequency supply, voltaic arc supply, heater supply, active supply and pulse bias supplyMulti-arc Targetmulti-arc target 5 pieces or 18 piecesTwins Targetmid-frequency twins target or planar target (1-4pairs)Vacuum Chambervertical (double deck water jacket or water chase), pumping system postpositionedVacuum Systemrotary pump & roots pump & diffusion pump & maintaining pump (optional: molecular, deep cold pump or deep cold system)Heating Systemfrom normal temperature to 350 degrees PID controlled, heated by stainless steel tubeInflation Systemmass flow controller (1-4 ways)Ultimate Vacuum6×10-4Pa clean and unloadedPump Timefrom atmosphere to 5×10-3Pa less than 13 minutesKeep Pressure Ratio1h≤0.6PaRotationtop rotation or bottom rotation & rotation and revolution, stepless speed regulation of frequency conversion, 0-20r/min Controlling Methodmanual & semi automatic / touching screen & PLCRemarkCan be designed and made according to customers requestThe above is for your information only